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PhD Student Ming Wei Wins Grand Prize in Materials Characterization at AVS and FSM Symposium

Ming Wei, a member of Dr. Schoenfeld's Nanophotonics Device group, won the grand prize in materials characterization at the Joint Symposium of the Florida Chapter of the American Vacuum Society (AVS) and Florida Society of Microscopy (FSM) for his poster entitled "Morphological, Structural, and Optical Characterization of High Quality Homoepitaxial ZnO Films for Ultraviolet Application."

"ZnO thin films were epitaxially grown on Zn-polar (0001) ZnO substrates by plasma-assisted molecular beam epitaxy at a low growth temperature range. An atomically flat surface with one or two monolayer step height along the [0001] direction was achieved with surface root mean square (rms) roughness below 0.3 nm. Surface treatment with acid etching and ozone exposure was required to remove contamination and reduces the likelihood of extrinsic defect migration into the epitaxial films. Good structural quality was evident in X-ray rocking curves with consistent narrow full width at half maximum (FWHM) of (0002), (102) and (201) peaks, indicating low threading dislocations. An electrostatic ion trap (EIT) was used for the oxygen plasma to reduce reactive oxygen species etching of the surface, resulting in a higher growth rate and fewer defects in the films. High Photoluminescence (PL) lifetimes with up to 380 ps were achieved. Room-temperature and low-temperature PL indicated high optical quality of the resultant films with few non-radiative recombination centers. The high morphological, structural, and optical quality may lead to the realization of high quality ultraviolet (UV) emitters such as lasers and Light Emitting Diodes."

Ming Wei Poster

Posted Thursday, March 7, 2013

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