Giving to CREOL
CREOL, The College of Optics & Photonics

CREOL Alum: Christian Keyser

Education
2005 PhD in Physics, advisor: Martin C. Richardson

Employment
1998 - 2002: Graduate Research Assistant, University of Central Florida, School of Optics
Current Position: Laser Engineer, Northrop Grumman Laser Systems
 
Publications
2006
Martin C. Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Simi A. George, Moza Mohammad Al-Rabban
"Laser plasma EUV sources based on droplet target technology"
EUV Sources for Lithography Ed: Vivek Bakshi, SPIE Press, volume Chapter 26, pages 687-718
2005
Martin C. Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Robert Bernath, Simi A. George, Somsak (Tony) Teerawattanasook
"Diagnostics for laser plasma EUV sources"
Proceedings of SPIE, volume 5580, pages 434-442
2005
Martin Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Robert Bernath, Simi George, Somsak (Tony) Teerawattanasook
"Diagnostics for laser plasma EUV sources"
Proceedings of SPIEvolume 5580, pages 434-442, 2005
2005
Simi George, Chiew-Seng Koay, Kazutoshi Takenoshita, Robert Bernath, Moza Al-Rabban, Christian Keyser, H. Scott, Martin Richardson
"EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas"
Proceedings of SPIEvolume 5751, 2005
2005
Simi A. George, Chiew-Seng Koay, Kazutoshi Takenoshita, Robert Bernath, Moza Mohammad Al-Rabban, Christian Keyser, H. Scott, Martin C. Richardson
"EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas"
Proceedings of SPIE, volume 5751
2005
C. Keyser
"Optical and spectral characterization of the water droplet laser plasma EUV source "
PhD Dissertation, CREOL, The College of Optics and Photonics
2005
Moza Mohammad Al-Rabban, Simi A. George, Christian Keyser, H. Scott, Martin C. Richardson
"Radiation transport modeling for Xe and Sn-doped droplet laser-plasma sources"
Proceedings of SPIE, volume 5751, pages 769-778
2005
Moza Al-Rabban, Simi George, Christian Keyser, H. Scott, Martin Richardson
"Radiation transport modeling for Xe and Sn-doped droplet laser-plasma sources"
Proceedings of SPIEvolume 5751, pages 769-778, 2005
2004
Martin Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Robert Bernath, Simi George, Somsak (Tony) Teerawattanasook
"Diagnostics of laser plasma EUV sources for Lithography"
Proceedings of the 25th International Congress on High Speed Photography, SPIE (Alexandria, VA, USA, 2004) 22-24 September 2004
2004
Martin C. Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser
"High conversion efficiency mass-limited Sn-based laser plasma source for EUV lithography"
Journal of Vacuum Science and Technology B, volume 22, number 2, pages 785-790
2004
Martin C. Richardson, Chiew-Seng Koay, Christian Keyser, Kazutoshi Takenoshita, Etsuo Fujiwara, Moza Mohammad Al-Rabban
"High-efficiency Tin-Based EUV Sources"
Proceedings of SPIE, volume 5196, number 14, 2004.
2004
Martin C. Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Simi A. George, Somsak (Tony) Teerawattanasook, Moza Mohammad Al-Rabban, H. Scott
"Laser plasma EUVL sources – progress and challenges"
Proceedings of SPIE, Emerging Lithographic Technologies VIII, volume 5374, pages 447-453
2004
Moza Al-Rabban, Simi George, Chiew-Seng Koay, Christian Keyser, Martin Richardson
"Model calculations of plasma expansion and EUV emission from Xe and Sn laser plasmas"
EUV Source Workshop (Santa Clara, CA) 21 February
2004
Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Moza Al-Rabban, Simi George, Martin Richardson
"Spectroscopic studies of the Sn-based droplet laser plasma EUV source"
SPIE Microlithography Symposium (Santa Clara, CA) 22-27 February 2004
2003
Christian Keyser, Chiew-Seng Koay, Kazutoshi Takenoshita, Martin C. Richardson, I.C.E. Turcu
"High conversion efficiency mass-limited laser plasma source for EUV lithography"
Proceedings of CLEO, June 2003. Paper CFH1.
2003
Chiew-Seng Koay, Christian Keyser, Kazutoshi Takenoshita, Moza Mohammad Al-Rabban, Martin C. Richardson, I.C.E. Turcu, Harry Rieger, A. Stone, J. H. Morris
"High conversion efficiency tin material laser plasma source for EUVL"
Emerging Lithographic Technologies VII, SPIE, volume 5037, pages 801-806
2003
I.C.E. Turcu, C. J. Gaeta, R. A. Forber, Harry Rieger, P. Hark, S. McLeod, B. E. Boerger, D. K. Bailey, J. Ben-Jacob, Martin C. Richardson, Christian Keyser, Kazutoshi Takenoshita, Chiew-Seng Koay
"High-power laser-produced-plasma radiation source for nanolithography"
Proceedings of SPIE, volume 5196, number 10
2003
Keyser, C.; Schriever, G.; Richardson, M.; Turcu, E.
"Studies of high-repetition-rate laser plasma EUV sources from droplet targets"
Applied Physics a-Materials Science & Processing. 77(2) 217-221
2002
Chiew-Seng Koay, Christian Keyser, Martin C. Richardson
"Developments in point sources for EUV lithography"
International Quantum Electronics Conference (Moscow, Russia), page 42
2002
Christian Keyser, Martin C. Richardson, I.C.E. Turcu
"Dynamics of high-repetition-rate laser plasma extreme ultraviolet sources from droplet targets"
Proceedings of SPIE High-Power Laser Ablation, volume 4760, number 4, pages 454-462
2002
Keyser, C.; Bernath, R.; Al-Rabban, M.; Richardson, M.
"Dynamics of mass-limited laser plasma targets as sources for extreme ultraviolet lithography"
Japanese Journal of Applied Physics Part 1-Regular Papers Short Notes & Review Papers. 41(6B) 4070-4073
2002
Christian Keyser, Chiew-Seng Koay, Robert Bernath, Martin C. Richardson, I.C.E. Turcu, Harry Rieger, Mike F. Powers
"Liquid Droplet-Target Laser Plasma Sources for EUV Lithography"
Proceedings of CLEO, volume 1, page 441, 19-24 May 2002.
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