Giving to CREOL
CREOL, The College of Optics & Photonics
Kazutoshi Takenoshita

CREOL Alum: Kazutoshi Takenoshita

Education
2006 PhD in Electrical Engineering, advisor: Martin C. Richardson

Employment
Current Position: Sr. Researcher, Samsung R&D Institute Japan
2002 - 2009: Senior Research Scientist, University of Central Florida, College of Optics & Photonics
 
Publications
2011
Martin Richardson, Kazutoshi Takenoshita, Chiew-Seng Koay
"Generator for Flux specific bursts of nano-particles"
US PATENT # 8,025,837
2010
R. Bernath, C. Brown, J. Duncan, K. Takenoshita, M. Richardson, J. Cunado
"Advanced Droplet and Plasma Targeting System"
U.S. Patent 7,718,985, May 18
2009
M. Richardson K. Takenoshita, R. Bernath, R. Kamtaprasad, J. Szilagyi, O. Rodriguez, N. Bodnar, S. A. George
"The Case for Solid-state Laser Driven EUV Sources"
EUV Source Workshop 2009, Baltimore, MD (2009).
2008
K. Takenoshita, R. Bernath, R. Kamptaprasad, J. Szilagyi, S. A. George, J. Cunado, M. Richardson, B. Fulford, I. Henderson, N. Hay, S. Ellwi
"Time-Multiplexed Solid-State Laser-driven EUV Sources for Beta-Tools and HVM"
International Symposium on Extreme Ultraviolet Lithography 2008, Lake Tahoe, California (2008).
2007
Kazutoshi Takenoshita, Simi George, Chiew-Seng Koay, Jose Cunado, Robert Bernath, Christopher Brown, Moza Al-Rabban, William Silfvast, Martin Richardson
"Characterization of the Tin-doped droplet laser plasma EUV soruces for HVM"
Proceedings of SPIE, Advanced lithographyvolume 6517, 2007
2007
Simi George, Jose Cunado, Somsak (Tony) Teerawattanasook, Robert Bernath, Christopher Brown, Kazutoshi Takenoshita, Chiew-Seng Koay, Martin Richardson
"High repetition-rate LPP-source facility for EUVL"
Proceedings of SPIE, Advanced lithographyvolume 6517, 2007
2007
Martin Richardson, Kazutoshi Takenoshita
"Tin inventory for HVM EUVL sources"
Proceedings of SPIE, Advanced lithographyvolume 6517, 2007
2007
Martin C. Richardson, Kazutoshi Takenoshita
"Tin inventory for HVM EUVL sources"
Proceedings of SPIE, Advanced lithography, volume 6517
2006
Tobias Schmid, Kazutoshi Takenoshita, Simi George, Somsak (Tony) Teerawattanasook, Martin Richardson
"Debris mitigation for high-NA laser plasma EUV sources"
SPIE 31st International Symposium on MICROLITHOGRAPHY (San Jose, CA, USA), February 2006
2006
Simi A. George, William T. Silfvast, Kazutoshi Takenoshita, Robert Bernath, Chiew-Seng Koay, Gregory Shimkaveg, Martin C. Richardson, Moza Mohammad Al-Rabban, H. Scott
"EUV Generation from Lithium Laser Plasma for Lithography"
Proceedings of SPIE, Advanced lithography, volume 6151
2006
Chiew-Seng Koay, Simi George, Kazutoshi Takenoshita, Martin Richardson, Moza Al-Rabban, Vivek Bakshi
"Factors Affecting the Conversion Efficiency of Tin Laser Plasma 13.5 nm Source"
SPIE 31st International Symposium on MICROLITHOGRAPHY (San Jose, CA, USA)
2006
Martin Richardson, Kazutoshi Takenoshita, Simi George, Ben Fulford, Ian Henderson, Nick Hay, Samir Ellwi
"High power EUV source with kW Solid state lasers and tin-doped droplet target"
5th International Symposium on EUV Lithography (Barcelona, Spain)
2006
Kazutoshi Takenoshita, Chiew-Seng Koay, Simi George, Tobias Schmid, Somsak (Tony) Teerawattanasook, Martin Richardson
"Ion flux and collector mirror erosion study for microscopic laser-plasma tin-doped droplet EUV sources"
SPIE 31st International Symposium on MICROLITHOGRAPHY (San Jose, CA, USA), February 2006
2006
Martin C. Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Simi A. George, Moza Mohammad Al-Rabban
"Laser plasma EUV sources based on droplet target technology"
EUV Sources for Lithography Ed: Vivek Bakshi, SPIE Press, volume Chapter 26, pages 687-718
2006
Simi George, Moza Al-Rabban, Kazutoshi Takenoshita, William Silfvast, Gregory Shimkaveg, Martin Richardson
"Out-of-band Spectroscopy of the Tin Droplet Target"
5th International Symposium on EUV Lithography, Barcelona, Spain
2006
Kazutoshi Takenoshita, Simi George, Martin Richardson
"Tin Material Consumption and the Mirror Lifetime for Droplet Laser Plasma Sources"
5th International Symposium on EUV Lithography (Barcelona, Spain)
2005
Kazutoshi Takenoshita, Chiew-Seng Koay, Somsak (Tony) Teerawattanasook, D. Malocha, Martin Richardson
"Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources"
Proceedings of SPIE, Emerging Lithographic Technologies IX, SPIE (San Jose, CA, USA, 2005) volume 5751-64, 1-3 March
2005
Kazutoshi Takenoshita, Chiew-Seng Koay, Somsak (Tony) Teerawattanasook, Martin C. Richardson
"Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources"
Proceedings of SPIE, volume 5751
2005
Kazutoshi Takenoshita, Chiew-Seng Koay, Somsak (Tony) Teerawattanasook, Martin Richardson
"Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources"
Proceedings of SPIEvolume 5751, 2005
2005
K. Takenoshita
"Debris characterization and mitigation of droplet laser plasma sources for EUV lithography "
PhD Dissertation, CREOL, The College of Optics and Photonics
2005
Martin C. Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Robert Bernath, Simi A. George, Somsak (Tony) Teerawattanasook
"Diagnostics for laser plasma EUV sources"
Proceedings of SPIE, volume 5580, pages 434-442
2005
Martin Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Robert Bernath, Simi George, Somsak (Tony) Teerawattanasook
"Diagnostics for laser plasma EUV sources"
Proceedings of SPIEvolume 5580, pages 434-442, 2005
2005
Martin Richardson, Chiew-Seng Koay, Kazutosji Takenoshita, Simi George, Robert Bernath, Moza Al-Rabban
"Efficient 13.5 nm EUV generation from a laser plasma"
Quantum Electronics and Laser Science Conference (QELS)volume 3, pages 1947- 1949 , May 2005
2005
Martin C. Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Simi A. George, Robert Bernath, Moza Mohammad Al-Rabban
"Efficient 13.5 nm EUV generation from a laser plasma"
Quantum Electronics and Laser Science Conference (QELS), volume 3, pages 1947- 1949, May 2005.
2005
Martin Richardson, Chiew-Seng Koay, Simi George, Kazutoshi Takenoshita, Robert Bernath, Moza Al-Rabban, H. Scott, Vivek Bakshi
"EUV source parameters of the laser-produced tin-doped micro-plasma"
Proceedings of SPIE, Emerging Lithographic Technologies IX, SPIE (San Jose, CA, USA, 2005) volume 5751-91, 1-3 March
2005
Simi George, Robert Bernath, Chiew-Seng Koay, Kazutoshi Takenoshita, Martin Richardson, Moza Al-Rabban, H. Scott
"EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas"
Proceedings of SPIE, Emerging Lithographic Technologies IX, SPIE (San Jose, CA, USA) volume 5751-92, 1-3 March 2005
2005
Simi A. George, Chiew-Seng Koay, Kazutoshi Takenoshita, Robert Bernath, Moza Mohammad Al-Rabban, Christian Keyser, H. Scott, Martin C. Richardson
"EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas"
Proceedings of SPIE, volume 5751
2005
Simi George, Chiew-Seng Koay, Kazutoshi Takenoshita, Robert Bernath, Moza Al-Rabban, Christian Keyser, H. Scott, Martin Richardson
"EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas"
Proceedings of SPIEvolume 5751, 2005
2005
Chiew-Seng Koay, Simi George, Kazutoshi Takenoshita, Robert Bernath, Etsuo Fujiwara, Martin Richardson
"High conversion efficiency microscopic tin-doped droplet laser plasma source for EUVL"
Proceedings of SPIE, Emerging Lithographic Technologies IX, SPIE (San Jose, CA, USA) volume 5751-30, 1-3 March 2005
2005
Chiew-Seng Koay, Simi A. George, Kazutoshi Takenoshita, Robert Bernath, Etsuo Fujiwara, Martin C. Richardson
"High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL"
Proceedings of SPIE, volume 5751
2005
Chiew-Seng Koay, Simi George, Kazutoshi Takenoshita, Robert Bernath, Etsuo Fujiwara, Martin Richardson
"High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL"
Proceedings of SPIEvolume 5751, 2005
2005
Kazutoshi Takenoshita, Chiew-Seng Koay, Simi A. George, Somsak (Tony) Teerawattanasook, Martin C. Richardson
"Ion emission measurements and mirror erosion studies for extreme ultraviolet lithography"
Journal of Vacuum Science and Technology B, volume 23, number 6, pages 2879-2884
2005
Moza Al-Rabban, Martin Richardson, Simi George, Chiew-Seng Koay, Kazutoshi Takenoshita, Robert Bernath, H. Scott
"Radiation transport modeling for Xe and Sn-doped droplet laser-plasma sources"
Proceedings of SPIE, Emerging Lithographic Technologies IX, SPIE (San Jose, CA, USA, 2005) volume 5751-90, 1-4 March
2004
Kazutoshi Takenoshita, Chiew-Seng Koay, Somsak (Tony) Teerawattanasook, Martin Richardson
"Debris studies for the tin-based droplet laser-plasma EUV source"
ISMT EUV Source Workshop (Santa Clara, CA) 21 February
2004
Kazutoshi Takenoshita, Chiew-Seng Koay, Somsak (Tony) Teerawattanasook, Martin Richardson
"Debris studies for the tin-based droplet laser-plasma EUV source"
SPIE Microlithography Symposium (Santa Clara, CA) 22-27 February 2004
2004
Kazutoshi Takenoshita, Chiew-Seng Koay, Somsak (Tony) Teerawattanasook, Martin C. Richardson
"Debris studies for the tin-based droplet laser-plasma EUV source"
Proceedings of SPIE, Emerging Lithographic Technologies VIII, volume 5374, pages 954-963
2004
Martin Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Robert Bernath, Simi George, Somsak (Tony) Teerawattanasook
"Diagnostics of laser plasma EUV sources for Lithography"
Proceedings of the 25th International Congress on High Speed Photography, SPIE (Alexandria, VA, USA, 2004) 22-24 September 2004
2004
Simi George, Robert Bernath, Chiew-Seng Koay, Kazutoshi Takenoshita, Martin Richardson, Moza Al-Rabban, H. Scott
"EUV spectroscopy of mass-limited Sn-doped laser plasmas"
International Symposium on EUV Lithography (Miyazaki, Japan) 1-5 November 2004
2004
Martin C. Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser
"High conversion efficiency mass-limited Sn-based laser plasma source for EUV lithography"
Journal of Vacuum Science and Technology B, volume 22, number 2, pages 785-790
2004
Chiew-Seng Koay, Kazutoshi Takenoshita, Simi George, Moza Al-Rabban, Robert Bernath, Etsuo Fujiwara, Martin Richardson
"High repetition-rate laser-plasma light source for EUV lithography"
Optics in the Southeast (Charlotte, NC) 4-5 November 2004
2004
Martin C. Richardson, Chiew-Seng Koay, Christian Keyser, Kazutoshi Takenoshita, Etsuo Fujiwara, Moza Mohammad Al-Rabban
"High-efficiency Tin-Based EUV Sources"
Proceedings of SPIE, volume 5196, number 14, 2004.
2004
Kazutoshi Takenoshita, Chiew-Seng Koay, Somsak (Tony) Teerawattanasook, Martin Richardson
"Ion emission characterization from microscopic laser-plasma tin-doped droplet sources"
International Symposium on EUV Lithography (Miyazaki, Japan) 1-5 November 2004
2004
Martin C. Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Simi A. George, Somsak (Tony) Teerawattanasook, Moza Mohammad Al-Rabban, H. Scott
"Laser plasma EUVL sources – progress and challenges"
Proceedings of SPIE, Emerging Lithographic Technologies VIII, volume 5374, pages 447-453
2004
Kazutoshi Takenoshita, Chiew-Seng Koay, Simi George, Somsak (Tony) Teerawattanasook, Martin Richardson, Vivek Bakshi
"Particulate debris characterization and mitigation from microscopic laser-plasma tin-doped droplet sources"
International Symposium on EUV Lithography (Miyazaki, Japan) 1-5 November 2004
2004
Chiew-Seng Koay, Simi George, Kazutoshi Takenoshita, Robert Bernath, Etsuo Fujiwara, Martin Richardson, Vivek Bakshi
"Precision 13 nm metrology of the microscopic tin-doped droplet laser-plasma source."
International Symposium on EUV Lithography (Miyazaki, Japan) 1-5 November
2004
Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Moza Al-Rabban, Simi George, Martin Richardson
"Spectroscopic studies of the Sn-based droplet laser plasma EUV source"
SPIE Microlithography Symposium (Santa Clara, CA) 22-27 February 2004
2004
Chiew-Seng Koay, Kazutoshi Takenoshita, Etsuo Fujiwara, Moza Mohammad Al-Rabban, Martin C. Richardson
"Spectroscopic studies of the Sn-based droplet laser plasma EUV source"
Proceedings of SPIE, Emerging Lithographic Technologies VIII, volume 5374, pages 964-970
2004
Martin Richardson, Chiew-Seng Koay, Simi George, Kazutoshi Takenoshita, Robert Bernath, Moza Al-Rabban, H. Scott
"The tin-doped droplet laser-plasma EUV source"
International Symposium on EUV Lithography (Miyazaki, Japan) 1-5 November 2004
2003
Christian Keyser, Chiew-Seng Koay, Kazutoshi Takenoshita, Martin C. Richardson, I.C.E. Turcu
"High conversion efficiency mass-limited laser plasma source for EUV lithography"
Proceedings of CLEO, June 2003. Paper CFH1.
2003
Chiew-Seng Koay, Christian Keyser, Kazutoshi Takenoshita, Moza Mohammad Al-Rabban, Martin C. Richardson, I.C.E. Turcu, Harry Rieger, A. Stone, J. H. Morris
"High conversion efficiency tin material laser plasma source for EUVL"
Emerging Lithographic Technologies VII, SPIE, volume 5037, pages 801-806
2003
I.C.E. Turcu, C. J. Gaeta, R. A. Forber, Harry Rieger, P. Hark, S. McLeod, B. E. Boerger, D. K. Bailey, J. Ben-Jacob, Martin C. Richardson, Christian Keyser, Kazutoshi Takenoshita, Chiew-Seng Koay
"High-power laser-produced-plasma radiation source for nanolithography"
Proceedings of SPIE, volume 5196, number 10
2003
Kazutoshi Takenoshita, Chiew-Seng Koay, Martin C. Richardson, I.C.E. Turcu
"The repeller field debris mitigation approach for EUV sources"
Emerging Lithographic Technologies VII, SPIE, volume 5037, pages 792-800
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