Giving to CREOL
CREOL, The College of Optics & Photonics
John Szilagyi

CREOL Alum: John Szilagyi

Education
2017 PhD in Electrical Engineering, advisor: Martin C. Richardson

Employment
Current Position: Engineer, KLA-Tencor Corporation, Milpitas, CA
2007 - 2016: Graduate Research Assistant, University of Central Florida, College of Optics & Photonics
 
Publications
2017
John Szilagyi
"Precision Metrology of Laser Plasmas in the XUV Band"
A dissertation submitted in partial fulfillment of the requirements for the degree of Doctor of Philosophy in CREOL, The College of Optics and Photonics at the University of Central Florida Orlando
2017
J. Szilagyi, H. Parchamy, M. Masnavi, and M.C. Richardson
"Spectral irradiance of singly and doubly ionized zinc in low-intensity laser-plasma ultraviolet light sources"
Journal of Applied Physics, 121(3), 033303
2015
Homaira Parchamy, John Szilagyi, Majid Masnavi, Martin Richardson
"Experimental and Numerical Investigation of Laser-Based Short-Wavelength Plasma Sources"
CLEO- Pacific Rim, Busan, Korea, September
2014
H. Parchamy, M. M. Mueller, J. Szilagyi, Y. Jang, M. Masnavi, M. C. Richardson
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.xnm"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-82
2014
H. Parchamy, M. Mueller, J. Szilagyi Y. Jang, M.C. Richardson, M. Masnavi
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.XX nm"
SPIE Advanced Lithography V, paper 9048-82, San Jose, CA, February
2014
M. Masnavi, J. Szilagyi, H. Parchamy, M. Mueller, M.C. Richardson
"Conversion efficiencies of laser – produced Sn plasma EUV light source"
SPIE Advanced Lithography V, paper 9048-79, San Jose, CA, February
2014
M. Masnavi, J. Szilagyi, H. Parchamy, Y. Jang, M. M. Mueller, M. C. Richardson
"Conversion efficiency of laser-produced Sn plasma EUV light source"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-79
2014
J. Szilagyi, H. Parchamy, M. Masnavi, M. C. Richardson
"Laser-based vacuum-ultraviolet light source"
SPIE Advanced Lithography 2014: Metrology, Inspection, and Process Control for Microlithography XXVIII, paper 9050-80
2014
M.C. Richardson, M. Masnavi, L. Shah, J. Szilagyi, J.D. Bradford, H. Parchamy, N. Bodnar, Y. Jang
"Potential of solid state laser-driven EUV sources for HVM lithography"
SPIE Advanced Lithography V 2014, paper 9048-77
2014
M.C. Richardson, M. Masnavi, L. Shah, J. Szilagyi, J.D. Bradford, H. Parchamy, N. Bodnar, Y. Jang
"Potential of solid state laser-driven EUV sources for HVM lithography"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-77
2013
M. Masnavi, J. Szilagyi, H. Parchamy, and M. Richardson
"Laser-based plasma sources at 6.6 and 60 nm"
CLEO (Optical Society of America), paper JW1D.2
2013
Majid Masnavi, John Szilagyi, Homaira Parchamy, and Martin C. Richardson
"Laser-plasma source parameters for Kr, Gd, and Tb ions at 6.6 nm"
Applied Physics Letters, 102, pp. 164102
2012
S. Döring, J. Szilagyi, S. Richter, F. Zimmermann, M. Richardson, A. Tünnermann, S. Nolte
"Evolution of hole shape and size during short and ultrashort pulse laser deep drilling"
Optics Express, 20(24), pp. 27147-27154
2011
J. Szilagyi
"Analysis of Hole Formation During Deep Drilling with Ultrashort Laser Pulses "
M.S. Thesis, Abbe School of Photonics (Atlantis-MILMI Program), Friedrich Schiller Univ., Jena, Germany, 2011.
2010
J. Szilagyi
"Extreme Ultraviolet Spectral Streak Camera"
M.S. Thesis, EECS, Univ. Central Florida, Orlando, FL, 2010.
2009
T. McComb, L. Shah, R. A. Sims, V. Sudesh, J. Szilagyi, M. Richardson
"High Power, Tunable Thulium Fiber Laser System for Atmospheric Propagation Experiments"
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on , vol., no., pp.1-2, 2-4 June 2009
2009
M. Richardson K. Takenoshita, R. Bernath, R. Kamtaprasad, J. Szilagyi, O. Rodriguez, N. Bodnar, S. A. George
"The Case for Solid-state Laser Driven EUV Sources"
EUV Source Workshop 2009, Baltimore, MD (2009).
2008
K. Takenoshita, R. Bernath, R. Kamptaprasad, J. Szilagyi, S. A. George, J. Cunado, M. Richardson, B. Fulford, I. Henderson, N. Hay, S. Ellwi
"Time-Multiplexed Solid-State Laser-driven EUV Sources for Beta-Tools and HVM"
International Symposium on Extreme Ultraviolet Lithography 2008, Lake Tahoe, California (2008).
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