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Dr Majid Masnavi

Dr Majid Masnavi

Research Scientist

Laser Plasma Laboratory
http://lpl.creol.ucf.edu/

Email

majidmasnavi@creol.ucf.edu

Phone

407-823-6830

Locations

CREOL 116

Biography

From 2000-2003, Majid Masnavi was a PhD candidate in Department of  Energy Sciences, Tokyo Institute of Technology, Tokyo, Japan. After receiving his PhD, he remained at the Tokyo Institute of Technology as a research associate, where his research involved investigating discharge and laser produced plasmas for extreme ultraviolet lithography sources and X-ray lasers. His current research interests are high energy density plasma science, laser / discharge / ion-beam produced plasmas, atomic physics of highly charged ions, particle / plasma simulation, and lithography related topics.

 


Recent Publications

2017
J. Szilagyi, H. Parchamy, M. Masnavi, and M.C. Richardson
"Spectral irradiance of singly and doubly ionized zinc in low-intensity laser-plasma ultraviolet light sources"
Journal of Applied Physics, 121(3), 033303
2015
Homaira Parchamy, John Szilagyi, Majid Masnavi, Martin Richardson
"Experimental and Numerical Investigation of Laser-Based Short-Wavelength Plasma Sources"
CLEO- Pacific Rim, Busan, Korea, September
2014
H. Parchamy, M. M. Mueller, J. Szilagyi, Y. Jang, M. Masnavi, M. C. Richardson
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.xnm"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-82
2014
H. Parchamy, M. Mueller, J. Szilagyi Y. Jang, M.C. Richardson, M. Masnavi
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.XX nm"
SPIE Advanced Lithography V, paper 9048-82, San Jose, CA, February
2014
M. Masnavi, J. Szilagyi, H. Parchamy, M. Mueller, M.C. Richardson
"Conversion efficiencies of laser – produced Sn plasma EUV light source"
SPIE Advanced Lithography V, paper 9048-79, San Jose, CA, February
2014
M. Masnavi, J. Szilagyi, H. Parchamy, Y. Jang, M. M. Mueller, M. C. Richardson
"Conversion efficiency of laser-produced Sn plasma EUV light source"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-79
2014
J. Szilagyi, H. Parchamy, M. Masnavi, M. C. Richardson
"Laser-based vacuum-ultraviolet light source"
SPIE Advanced Lithography 2014: Metrology, Inspection, and Process Control for Microlithography XXVIII, paper 9050-80
2014
M.C. Richardson, M. Masnavi, L. Shah, J. Szilagyi, J.D. Bradford, H. Parchamy, N. Bodnar, Y. Jang
"Potential of solid state laser-driven EUV sources for HVM lithography"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-77
2014
M.C. Richardson, M. Masnavi, L. Shah, J. Szilagyi, J.D. Bradford, H. Parchamy, N. Bodnar, Y. Jang
"Potential of solid state laser-driven EUV sources for HVM lithography"
SPIE Advanced Lithography V 2014, paper 9048-77
2013
M. Masnavi, J. Szilagyi, H. Parchamy, and M. Richardson
"Laser-based plasma sources at 6.6 and 60 nm"
CLEO (Optical Society of America), paper JW1D.2
more...

Research

Science & Technology Skip Navigation Links.
Lasers
EUV & X-ray Lasers
Optoelectronics & Integrated Photonics
Quantum Dots & Nanostructures
Nonlinear & Quantum Optics
Nonlinear Optics & Spectroscopy
Quantum Optics
Applications Skip Navigation Links.
Optical EUV & X-ray Astronomy
Optical, EUV & X-ray Lithography
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