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John Szilagyi

John Szilagyi

Engineer

Laser Plasma Laboratory
http://lpl.creol.ucf.edu/

Email

szilagyi@creol.ucf.edu

Phone

407-412-3547 (Mobile)
407-823-2979 (Office)

Locations


Biography


Recent Publications

2017
John Szilagyi
"Precision Metrology of Laser Plasmas in the XUV Band"
A dissertation submitted in partial fulfillment of the requirements for the degree of Doctor of Philosophy in CREOL, The College of Optics and Photonics at the University of Central Florida Orlando
2017
J. Szilagyi, H. Parchamy, M. Masnavi, and M.C. Richardson
"Spectral irradiance of singly and doubly ionized zinc in low-intensity laser-plasma ultraviolet light sources"
Journal of Applied Physics, 121(3), 033303
2015
Homaira Parchamy, John Szilagyi, Majid Masnavi, Martin Richardson
"Experimental and Numerical Investigation of Laser-Based Short-Wavelength Plasma Sources"
CLEO- Pacific Rim, Busan, Korea, September
2014
H. Parchamy, M. M. Mueller, J. Szilagyi, Y. Jang, M. Masnavi, M. C. Richardson
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.xnm"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-82
2014
H. Parchamy, M. Mueller, J. Szilagyi Y. Jang, M.C. Richardson, M. Masnavi
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.XX nm"
SPIE Advanced Lithography V, paper 9048-82, San Jose, CA, February
2014
M. Masnavi, J. Szilagyi, H. Parchamy, M. Mueller, M.C. Richardson
"Conversion efficiencies of laser – produced Sn plasma EUV light source"
SPIE Advanced Lithography V, paper 9048-79, San Jose, CA, February
2014
M. Masnavi, J. Szilagyi, H. Parchamy, Y. Jang, M. M. Mueller, M. C. Richardson
"Conversion efficiency of laser-produced Sn plasma EUV light source"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-79
2014
J. Szilagyi, H. Parchamy, M. Masnavi, M. C. Richardson
"Laser-based vacuum-ultraviolet light source"
SPIE Advanced Lithography 2014: Metrology, Inspection, and Process Control for Microlithography XXVIII, paper 9050-80
2014
M.C. Richardson, M. Masnavi, L. Shah, J. Szilagyi, J.D. Bradford, H. Parchamy, N. Bodnar, Y. Jang
"Potential of solid state laser-driven EUV sources for HVM lithography"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-77
2014
M.C. Richardson, M. Masnavi, L. Shah, J. Szilagyi, J.D. Bradford, H. Parchamy, N. Bodnar, Y. Jang
"Potential of solid state laser-driven EUV sources for HVM lithography"
SPIE Advanced Lithography V 2014, paper 9048-77
more...

Research

Science & Technology Skip Navigation Links.
Lasers
EUV & X-ray Lasers
Ultrafast Lasers
Applications Skip Navigation Links.
Laser Material Processing
Optical, EUV & X-ray Lithography
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