CREOL, The College of Optics & Photonics provides multi-user facilties available to UCF Faculty, research scientists,
and students as well as to companies and other outside users.
Nanophotonics Systems Fabrication Facility, a 3,000 ft2 facility
containing Class 100 and Class 1000 clean rooms. Used for the
fabrication and study of nanostructured materials and nanophotonic integrated circuits.
For available equipment and usage fees, see the
information page or contact
Leica EBPG5000+ electron beam lithography
system is capable of running at 20, 50 and 100 kV,
with a minimum spot size of less than 10nm. The main exposure field size may range between
160um X 160um and 1mm X 1mm with a stitching value of less than 50nm. Electron-beam lithography
can be performed on a variety of substrate sizes, including five inch masks, three and four inch wafers,
and small pieces. A multi-substrate load lock is used to aid in the sequential processing of multiple jobs.
Contact Dr. Ivan Divliansky.
Woollam M2000 Mapping Spectroscopic Ellipsometer
The M2000 High-Speed Scanning Variable Angle Spectroscopic Ellipsometer
enables the mapping of layer thickness as well as linear optical properties (refractive index, absorption coefficient, depolarization factors, anisotropy)
of single layer or multilayer films at wavelengths between 0.24μm - 1.7μm with a spectral resolution of 3-6nm.
The system supports mapping of up to 6” diameter wafers.
A complete UV-NIR spectrum can be acquired in under 5 seconds with a 0.1 mm spatial resolution. Room 242.
Contact: Prof. Pieter G. Kik.
Optoelectronic Fabrication Cleanroom. The 800 sq. ft. cleanroom is a multi-user facility consisting of class 100 and class
10,000 cleanrooms, and is used in the development of optoelectronic semiconductor devices. The facility equipment includes
a Suss MJB-3 aligner, a Plasma-Therm 790 RIE/PECVD, an Edwards thermal evaporator, along with a bonder, a scriber and microscope.
Rm 211. For more information contact Prof. Patrick LiKamWa.
Scanning Electron Microscope (SEM) Facility. The Vega SBH SEM built by Tescan is a tungsten-filament scanning electron microscope.
The system is designed with a fully electronic column and is capable of imaging from 1-30 keV with nanometer scale resolution.
Additionally, the system is equipped with the state of the art sample positioning stage with 5 nm resolution and a full
scale travel of 42 mm. The shared SEM is ideal for checking the fidelity of microstructures fabricated routinely in the
CREOL cleanroom. Rm 176. For more information contact
Prof. Masahiro Ishigami.
Spectroscopy and microscopy facility. This facility contains a Varian Cary 500 Spectrophotometer capable
of measuring light absorption in both transmitted and reflected light in the UV/VIS/NIR spectral range and an Olympus Nomarski
Interference Microscope. Rm 159. For more information contact James Ross.
Zygo Facility. The Zygo NewView 6300 scanning white light and optical phase-shifting Interferometer is capable of surface
profile measurements with a height resolution of 0.1 nm and a lateral resolution down to 0.45 μm. Rm 211B. For more information
consult the specifications.
Contact: Prof. Martin Richardson.
Machine Shop. The CREOL machine shop has two modern Sharp LMV milling machines and a 16-50G lathe capable of achieving the
tolerances required for the instruments used in CREOL. Classes are offered to qualify research scientists and students to
safely modify and construct instruments critical to their research. Rm A106.
Contact: Richard Zotti.