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Journal Papers (refereed)
2017
J. Szilagyi, H. Parchamy, M. Masnavi, and M.C. Richardson
"Spectral irradiance of singly and doubly ionized zinc in low-intensity laser-plasma ultraviolet light sources"
Journal of Applied Physics, 121(3), 033303
2013
Majid Masnavi, John Szilagyi, Homaira Parchamy, and Martin C. Richardson
"Laser-plasma source parameters for Kr, Gd, and Tb ions at 6.6 nm"
Applied Physics Letters, 102, pp. 164102
2011
M. Masnavi, M. Nakajima, K. Horioka, H. P. Araghy, A. Endo
"Simulation of particle velocity in a laser-produced tin plasma extreme ultraviolet source"
JOURNAL OF APPLIED PHYSICS 109, 123306 (2011)
2008
M. Masnavi, M. Nakajima, E. Hotta, K. Horioka
"Estimation of the Lyman-alpha line intensity in a lithium-based discharge-produced plasma source"
JOURNAL OF APPLIED PHYSICS 103, 013303 (2008)
2007
M. Masnavi, M. Nakajima, E. Hotta, K. Horioka, G. Niimi, A. Sasaki
"Estimation of optimum density and temperature for maximum efficiency of tin ions in Z discharge extreme ultraviolet sources"
JOURNAL OF APPLIED PHYSICS 101, 033306 (2007)
2006
M. Masnavi, M. Nakajima, A. Sasaki, E. Hotta, K. Horioka
"Potential of discharge-based lithium plasma as an extreme ultraviolet source"
APPLIED PHYSICS LETTERS 89, 031503 (2006)
2005
M. Masnavi, M. Nakajima, A. Sasaki, E. Hotta, K. Horioka
"Approach to optimize conversion efficiency of discharge-pumped plasma extreme ultraviolet sources"
APPLIED PHYSICS LETTERS 87, 111502 (2005)
Conference Proceedings
2014
H. Parchamy, M. M. Mueller, J. Szilagyi, Y. Jang, M. Masnavi, M. C. Richardson
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.xnm"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-82
2014
M. Masnavi, J. Szilagyi, H. Parchamy, Y. Jang, M. M. Mueller, M. C. Richardson
"Conversion efficiency of laser-produced Sn plasma EUV light source"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-79
2014
J. Szilagyi, H. Parchamy, M. Masnavi, M. C. Richardson
"Laser-based vacuum-ultraviolet light source"
SPIE Advanced Lithography 2014: Metrology, Inspection, and Process Control for Microlithography XXVIII, paper 9050-80
2014
M.C. Richardson, M. Masnavi, L. Shah, J. Szilagyi, J.D. Bradford, H. Parchamy, N. Bodnar, Y. Jang
"Potential of solid state laser-driven EUV sources for HVM lithography"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-77
2013
M. Masnavi, J. Szilagyi, H. Parchamy, and M. Richardson
"Laser-based plasma sources at 6.6 and 60 nm"
CLEO (Optical Society of America), paper JW1D.2
2010
M. Masnavi et al
"Molecular dynamics investigation on Tin"
American Physical Society Meetings 2010, November 8-12, Chicago
Presentations
2015
Homaira Parchamy, John Szilagyi, Majid Masnavi, Martin Richardson
"Experimental and Numerical Investigation of Laser-Based Short-Wavelength Plasma Sources"
CLEO- Pacific Rim, Busan, Korea, September
2014
H. Parchamy, M. Mueller, J. Szilagyi Y. Jang, M.C. Richardson, M. Masnavi
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.XX nm"
SPIE Advanced Lithography V, paper 9048-82, San Jose, CA, February
2014
M. Masnavi, J. Szilagyi, H. Parchamy, M. Mueller, M.C. Richardson
"Conversion efficiencies of laser – produced Sn plasma EUV light source"
SPIE Advanced Lithography V, paper 9048-79, San Jose, CA, February
2014
M.C. Richardson, M. Masnavi, L. Shah, J. Szilagyi, J.D. Bradford, H. Parchamy, N. Bodnar, Y. Jang
"Potential of solid state laser-driven EUV sources for HVM lithography"
SPIE Advanced Lithography V 2014, paper 9048-77
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