Giving to CREOL CREOL, The College of Optics & Photonics
Dr Majid Masnavi

Dr Majid Masnavi

Research Scientist

Laser Plasma Laboratory
http://lpl.creol.ucf.edu/

Email

majidmasnavi@creol.ucf.edu

Phone

407-823-6830

Locations

CREOL 116

Biography

From 2000-2003, Majid Masnavi was a PhD candidate in Department of  Energy Sciences, Tokyo Institute of Technology, Tokyo, Japan. After receiving his PhD, he remained at the Tokyo Institute of Technology as a research associate, where his research involved investigating discharge and laser produced plasmas for extreme ultraviolet lithography sources and X-ray lasers. His current research interests are high energy density plasma science, laser / discharge / ion-beam produced plasmas, atomic physics of highly charged ions, particle / plasma simulation, and lithography related topics.

 


Recent Publications

2018
H. Parchamy, J. Szilagyi, M. Masnavi, and M. Richardson
"Quantitative analysis of vacuum-ultraviolet radiation from nanosecond laser-zinc interaction"
Optics and Laser Technology, 103, pp. 1-7
2017
H. Parchamy, J. Szilagyi, M. Masnavi, and M.C. Richardson
"Ultraviolet out-of-band radiation studies in laser tin plasma sources"
Journal of Applied Physics, 122(17), 173303
2017
J. Szilagyi, H. Parchamy, M. Masnavi, and M.C. Richardson
"Spectral irradiance of singly and doubly ionized zinc in low-intensity laser-plasma ultraviolet light sources"
Journal of Applied Physics, 121(3), 033303
2015
Homaira Parchamy, John Szilagyi, Majid Masnavi, Martin Richardson
"Experimental and Numerical Investigation of Laser-Based Short-Wavelength Plasma Sources"
CLEO- Pacific Rim, Busan, Korea, September
2014
H. Parchamy, M. M. Mueller, J. Szilagyi, Y. Jang, M. Masnavi, M. C. Richardson
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.xnm"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-82
2014
H. Parchamy, M. Mueller, J. Szilagyi Y. Jang, M.C. Richardson, M. Masnavi
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.XX nm"
SPIE Advanced Lithography V, paper 9048-82, San Jose, CA, February
2014
M. Masnavi, J. Szilagyi, H. Parchamy, M. Mueller, M.C. Richardson
"Conversion efficiencies of laser – produced Sn plasma EUV light source"
SPIE Advanced Lithography V, paper 9048-79, San Jose, CA, February
2014
M. Masnavi, J. Szilagyi, H. Parchamy, Y. Jang, M. M. Mueller, M. C. Richardson
"Conversion efficiency of laser-produced Sn plasma EUV light source"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-79
2014
J. Szilagyi, H. Parchamy, M. Masnavi, M. C. Richardson
"Laser-based vacuum-ultraviolet light source"
SPIE Advanced Lithography 2014: Metrology, Inspection, and Process Control for Microlithography XXVIII, paper 9050-80
2014
M.C. Richardson, M. Masnavi, L. Shah, J. Szilagyi, J.D. Bradford, H. Parchamy, N. Bodnar, Y. Jang
"Potential of solid state laser-driven EUV sources for HVM lithography"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-77
more...

Research

Science & Technology Skip Navigation Links.
Lasers
EUV & X-ray Lasers
Optoelectronics & Integrated Photonics
Quantum Dots & Nanostructures
Nonlinear & Quantum Optics
Nonlinear Optics & Spectroscopy
Quantum Optics
Applications Skip Navigation Links.
Optical EUV & X-ray Astronomy
Optical, EUV & X-ray Lithography
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