Giving to CREOL CREOL, The College of Optics & Photonics
Dr Homaira Parchamy Araghy

Dr Homaira Parchamy Araghy

Research Scientist

Laser Plasma Laboratory
http://lpl.creol.ucf.edu/

Email

HomairaParchamy@creol.ucf.edu

Phone

407-823-6843

Locations

CREOL 163

Biography


Links


Recent Publications

2018
H. Parchamy, J. Szilagyi, M. Masnavi, and M. Richardson
"Quantitative analysis of vacuum-ultraviolet radiation from nanosecond laser-zinc interaction"
Optics and Laser Technology, 103, pp. 1-7
2017
H. Parchamy, J. Szilagyi, M. Masnavi, and M.C. Richardson
"Ultraviolet out-of-band radiation studies in laser tin plasma sources"
Journal of Applied Physics, 122(17), 173303
2017
J. Szilagyi, H. Parchamy, M. Masnavi, and M.C. Richardson
"Spectral irradiance of singly and doubly ionized zinc in low-intensity laser-plasma ultraviolet light sources"
Journal of Applied Physics, 121(3), 033303
2015
Homaira Parchamy, John Szilagyi, Majid Masnavi, Martin Richardson
"Experimental and Numerical Investigation of Laser-Based Short-Wavelength Plasma Sources"
CLEO- Pacific Rim, Busan, Korea, September
2014
H. Parchamy, M. M. Mueller, J. Szilagyi, Y. Jang, M. Masnavi, M. C. Richardson
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.xnm"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-82
2014
H. Parchamy, M. Mueller, J. Szilagyi Y. Jang, M.C. Richardson, M. Masnavi
"Conversion efficiencies from laser-produced Kr, Mo, Gd, and Tb plasmas at 6.XX nm"
SPIE Advanced Lithography V, paper 9048-82, San Jose, CA, February
2014
M. Masnavi, J. Szilagyi, H. Parchamy, M. Mueller, M.C. Richardson
"Conversion efficiencies of laser – produced Sn plasma EUV light source"
SPIE Advanced Lithography V, paper 9048-79, San Jose, CA, February
2014
M. Masnavi, J. Szilagyi, H. Parchamy, Y. Jang, M. M. Mueller, M. C. Richardson
"Conversion efficiency of laser-produced Sn plasma EUV light source"
SPIE Advanced Lithography 2014: Extreme Ultraviolet (EUV) Lithography V, paper 9048-79
2014
J. Szilagyi, H. Parchamy, M. Masnavi, M. C. Richardson
"Laser-based vacuum-ultraviolet light source"
SPIE Advanced Lithography 2014: Metrology, Inspection, and Process Control for Microlithography XXVIII, paper 9050-80
2014
M.C. Richardson, M. Masnavi, L. Shah, J. Szilagyi, J.D. Bradford, H. Parchamy, N. Bodnar, Y. Jang
"Potential of solid state laser-driven EUV sources for HVM lithography"
SPIE Advanced Lithography V 2014, paper 9048-77
more...

Research

Science & Technology Skip Navigation Links.
Lasers
EUV & X-ray Lasers
Ultrafast Lasers
Nonlinear & Quantum Optics
Nonlinear Optics & Spectroscopy
Applications Skip Navigation Links.
Laser Material Processing
Optical, EUV & X-ray Lithography
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